Browsing by Author McCulloch, D G

Jump to: 0-9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
or enter first few letters:  
Showing results 1 to 20 of 47  next >
Issue DateTitleAuthor(s)Citation
2005Ab initio studies of amorphous carbon filmsBilek, Marcela; Malloch, H; Marks, Nigel; McKenzie, David; McCulloch, D G; Merchant, A R; Physics; Physics; Physics; PhysicsAb initio studies of amorphous carbon films, Surface and Coatings Technology, vol.198,(1-3),2005,pp 212-216
2008Abrupt stress induced transformation in amorphous carbon films with a highly conductive transition phaseMarks, Nigel; McKenzie, David; Lau, D.W.M; McCulloch, D G; Partridge, J G; Tay, B K; Taylor, M B; Teo, E H T; Physics; PhysicsAbrupt stress induced transformation in amorphous carbon films with a highly conductive transition phase, Physical Review Letters, vol.100,(17),2008,pp 176101-1-176101-4
2013Characterization and device applications of ZnO films deposited by high power impulse magnetron sputtering (HiPIMS)Bilek, Marcela; Mayes, E.L.H; McCulloch, D G; McDougall, N.L; Partridge, J G; PhysicsCharacterization and device applications of ZnO films deposited by high power impulse magnetron sputtering (HiPIMS), Journal of Physics D: Applied Physics, vol.46, 16, 2013,pp 1-5
2005Characterization of cathodic arc deposited titanium aluminium nitride films prepared using plasma immersion ion implantationBilek, Marcela; Lim, Sunnie; McKenzie, David; Barnard, A S; McCulloch, D G; Russo, S P; Torpy, A; Physics; Physics; PhysicsCharacterization of cathodic arc deposited titanium aluminium nitride films prepared using plasma immersion ion implantation, Journal of Physics: Condensed Matter, vol.17,(17),2005,pp 2791-2800
2015Co-deposition of band-gap tuned Zn1-xMgxO using high impulse power- and dc-magnetron sputteringBilek, Marcela; McKenzie, David; Mayes, Edwin; McCulloch, D G; Murdoch, Billy; Partridge, Jim; Physics; PhysicsCo-deposition of band-gap tuned Zn1-xMgxO using high impulse power- and dc-magnetron sputtering, Journal of Physics D: Applied Physics, vol.48, 13, 2015,pp 1-8
2014A combinatorial comparison of DC and high power impulse magnetron sputtered Cr2AlCBilek, Marcela; McKenzie, David; Carlsson, P.; Eklund, Per; Field, M R; McCulloch, D G; Partridge, J G; Physics; PhysicsA combinatorial comparison of DC and high power impulse magnetron sputtered Cr2AlC, Surface and Coatings Technology, vol.259, Part C, 2014,pp 746-750
2006Control of stress and delamination in single and multi-layer carbon thin films prepared by cathodic arc and RF plasma deposition and implantationBilek, Marcela; Ha, Peter; McKenzie, David; Chu, Paul K.; Doyle, E D; McCulloch, D G; Physics; Physics; PhysicsControl of stress and delamination in single and multi-layer carbon thin films prepared by cathodic arc and RF plasma deposition and implantation, Surface and Coatings Technology, vol.200,(22 to 23),2006,pp 6405-6408
2003Control of stress and microstructure in cathodic arc deposited filmsBilek, Marcela; Lim, Sunnie; McKenzie, David; Tarrant, Richard; McCulloch, D G; Physics; Physics; Physics; PhysicsControl of stress and microstructure in cathodic arc deposited films, IEEE Transactions on Plasma Science, vol.31,(5),2003,pp 939-944
2011Controlled glow to arc transition in sputtering for high rate deposition of carbon filmsLattemann, M.; McKenzie, David; Abendroth, B.; McCulloch, D G; Moafi, A; Physics; PhysicsControlled glow to arc transition in sputtering for high rate deposition of carbon films, Diamond and Related Materials, vol.20, 2, 2011,pp 68-74
2004Correlation Between Stress And Hardness In Pulsed Cathodic Arc Deposited Titanium/Vanadium Nitride AlloysBilek, Marcela; Davies, Kerrie; Gan, Bee; McKenzie, David; Latella, B A; McCulloch, D G; Taylor, M B; Physics; Physics; Physics; PhysicsCorrelation Between Stress And Hardness In Pulsed Cathodic Arc Deposited Titanium/Vanadium Nitride Alloys, Journal of Physics: Condensed Matter, vol.16,(17),2004,pp 7947-7954
2005Dark field microscopy for diffraction analysis of amorphous carbon solidsMcKenzie, David; Petersen, Timothy; Cockayne, David J.H.; McBride, W E; McCulloch, D G; Physics; Electron MicroscopeDark field microscopy for diffraction analysis of amorphous carbon solids, Journal of Non-Crystalline Solids, vol.351,(5),2005,pp 413-417
2016Duty cycle control in reactive high-power impulse magnetron sputtering of hafnium and niobiumBilek, Marcela; Falconer, Ian; Ganesan, Rajesh; McKenzie, David; Ross, Ann; Treverrow, B; Xie, Dong; McCulloch, D G; Murdoch, Billy; Partridge, Jim; Physics; Physics; Physics; Physics; Physics; Physics; PhysicsDuty cycle control in reactive high-power impulse magnetron sputtering of hafnium and niobium, Journal of Physics D: Applied Physics, vol.49, 24, 2016,pp 1-11
2004Effect Of Intrinsic Stress On Preferred Orientation In Aln Thin FilmsBilek, Marcela; Gan, Bee; McKenzie, David; McCulloch, D G; Taylor, M B; Physics; Physics; PhysicsEffect Of Intrinsic Stress On Preferred Orientation In Aln Thin Films, Journal of Applied Physics, vol.95,(4),2004,pp 2130-2134
2006The effect of plasma immersion ion implantation on the contact pressure and composition of titanium nitride thin filmsBilek, Marcela; Lim, Sunnie; McKenzie, David; Swain, Michael; du, P e; McCulloch, D G; Wuhrer, R; Physics; Physics; Physics; Dentistry FacultyThe effect of plasma immersion ion implantation on the contact pressure and composition of titanium nitride thin films, Surface and Coatings Technology, vol.201,(N/A),2006,pp 396-400
2005Electrical conductivity as a measure of the continuity of titanium and vanadium thin filmsBilek, Marcela; Davies, Kerrie; Gan, Bee; Lim, Sunnie; McKenzie, David; Burgmann, F. A.; McCulloch, D G; Physics; Physics; Physics; Physics; PhysicsElectrical conductivity as a measure of the continuity of titanium and vanadium thin films, Thin Solid Films, vol.474,(1-2),2005,pp 341-345
2008The electronic structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputteringLim, Sunnie; Anders, A.; Burgess, R W; Field, M R; Keast, Vicki J.; McCulloch, D G; PhysicsThe electronic structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering, Journal of Physics: Condensed Matter, vol.20,(17),2008,pp 175216-1-175216-7
2011Energetic deposition of carbon in a cathodic vacuum arc with a biased meshMcKenzie, David; Lau, D.W.M; McCulloch, D G; Moafi, A; Partridge, J G; Sadek, A Z; PhysicsEnergetic deposition of carbon in a cathodic vacuum arc with a biased mesh, Journal of Applied Physics, vol.109, 7, 2011,pp 1-6
2009Enhancing the hardness of Al/W nanostructured coatingsBilek, Marcela; Lim, Sunnie; McKenzie, David; Ryves, Luke; Burgmann, F. A.; McCulloch, D G; Physics; Physics; Physics; PhysicsEnhancing the hardness of Al/W nanostructured coatings, Journal of Physics: Condensed Matter, vol.21, 5, 2009,pp 055003-1-055003-9
2007High-temperature formation of concentric fullerene-like structures within foam-like carbon: Experiment and molecular dynamics simulationMarks, Nigel; Lau, D.W.M; Madsen, N.R.; McCulloch, D G; Rode, Andrei V.; PhysicsHigh-temperature formation of concentric fullerene-like structures within foam-like carbon: Experiment and molecular dynamics simulation, Physical Review B (Condensed Matter and Materials Physics), vol.75,(23),2007,pp 233408-1-233408-4
2008HRMC: Hybrid Reverse Monte Carlo method with silicon and carbon potentialsPetersen, Timothy; McCulloch, D G; O'Malley, B; Opletal, G.; Snook, I. K.; Yarovsky, I; Electron MicroscopeHRMC: Hybrid Reverse Monte Carlo method with silicon and carbon potentials, Computer Physics Communications, vol.178,(N/A),2008,pp 777-787