Browsing by Author Chai, J W

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Issue DateTitleAuthor(s)Citation
2008Influence of hydrogen dilution on the growth of nanocrystalline silicon carbide films by low-frequency inductively coupled plasma chemical vapor depositionOstrikov, Kostyantyn; Chai, J W; Cheng, Qijin; Huang, S Y; Long, J D; Ren, Y P; Rutkevych, P P; Xu, S; PhysicsInfluence of hydrogen dilution on the growth of nanocrystalline silicon carbide films by low-frequency inductively coupled plasma chemical vapor deposition, Thin Solid Films, vol.516, 18, 2008,pp 5991-5995
2009p-type doping of ZnO by means of high-density inductively coupled plasmasCheng, Qijin; Ostrikov, Kostyantyn; Chai, J W; Huang, S Y; Long, J D; Xu, S; Physics; Physicsp-type doping of ZnO by means of high-density inductively coupled plasmas, Materials Letters, vol.63, N/A,pp 972-974
2008Visible photoluminescence from plasma-synthesized SiO2-buffered SiNx films: Effect of film thickness and annealing temperatureOstrikov, Kostyantyn; Chai, J W; Cheng, Q J; Ee, Y C; Long, J D; Xu, Ming; Xu, Shuyan; PhysicsVisible photoluminescence from plasma-synthesized SiO2-buffered SiNx films: Effect of film thickness and annealing temperature, Journal of Applied Physics, vol.103,(5),2008,pp 053512-1-053512-6