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|Title:||193nm photolytic mechanism in Er/Al doped silica|
|Publisher:||(IEEE) Institute of Electrical and Electronics Engineers|
|Citation:||193nm photolytic mechanism in Er/Al doped silica, Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference on Optical Fibre Technology, vol.0, 2008, pp. 1-2|
|Disclaimer:||This work has been made available to the staff and students of the University of Sydney for the purposes of research and study only. It constitutes material that is held by the University for the purposes of reporting for HERDC and the ERA. This work may not be downloaded, copied and distributed to any third party .|
|Type:||E1 - Conference proceeding|
|Appears in Collections:||University of Sydney Research Outputs|
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